A supercomputer located in RCPTM allows to offer to researchers and industrial partners a research in theoretical chemistry as well as in simulations of reactions or interactions of substances with organism or other simulations of reactions that are very difficult to implement in real conditions.
Reaction autoclave enables a big variety of chemical synthesis, starting from hydrogenation through hydrothermal synthesis up to reacions in lower temperatures.
Vacuum thin layers deposition - Vaccum system VS1200 allows deposition of thin layers inlcuding multiple layers of different materials (sanfwiches) with improved adhesion thanks high output ion source. Ion assisted deposition enables deposition of oxides for reaching the highest quality layers.
Plasma thin layer deposition - hybrid plasma HIPP deposition system allows the preparation of dielectric optical layers, thin films on polymer films as well as deposition of functional structures on substrates with conductive electrode.